Raith is a leading precision technology solution provider for nanofabrication,electron beam lithography,focused ion beam fabrication,nanoengineering and reverse engineering applications.
The headquarter is in Dortmund, Germany, it works as close as possible with customers in the most important global markets through subsidiaries in the Netherlands, the USA and in Asia(Hong Kong & Beijing) and through an extensive partner and service network.
Customers include universities and other organizations involved in various fields of nanotechnology research and materials science – as well as industrial and medium sized enterprises that use nanotechnology for specific product applications or produce compound semiconductors.
The EBPG5200 is a high performance nanolithography system with full 200 mm writing capability. This Electron Beam Lithography system presents a further evolutionary stage of the highly successful and field-proven EBPG series. It offers a wide range of leading edge solutions for both direct write nanolithography and R&D mask making in universities and commercial centers of excellence.
VOYAGER is recommended for all industrial and academic Electron Beam Lithography applications where the important objectives are high write throughput and maximum resolution.
Samples of up to 8 inches are exposed at high speed. The necessary system stability is ensured, even in difficult environments, by a thermally stabilized and environmentally tolerant housing.
VELION is a novel FIB-SEM instrument in which FIB nanofabrication has matured into the standard technique for fabricating three dimensional and high resolution nanostructures, such as plasmonic devices, nano-fluidics, localized implantation.