Raith is a leading precision technology solution provider for nanofabrication, electron beam lithography, focused ion beam fabrication, nanoengineering and reverse engineering applications.
The headquarter is in Dortmund, Germany, it works as close as possible with customers in the most important global markets through subsidiaries in the Netherlands, the USA and in Asia(Hong Kong & Beijing) and through an extensive partner and service network.
Customers include universities and other organizations involved in various fields of nanotechnology research and materials science – as well as industrial and medium sized enterprises that use nanotechnology for specific product applications or produce compound semiconductors.
Raith’s broad nanofabrication portfolio offers the right solution for all your nanofabrication challenges. Whether you are seeking a nanolithography system to write your industrial or academic applications, want to choose from a broad selection of ions for focused ion beam lithography, or already have an SEM / FIB-SEM and are looking for a way to expand its use to nanofabrication, Raith has the optimal solution for you. Furthermore, we offer lithography systems with nanoengineering options and SEM-based solutions for large-area image acquisition. Whenever nanostructures need to be created or observed, look what Raith nanofabrication, imaging, and lithography systems can do for you to get the best out of your applications. Team up with Raith for a lifelong partnership in nanofabrication.
High resolution lithography with automation and throughput
Shaping the future of Nanoscience
The EBPG5200 is a high performance nanolithography system with full 200 mm writing capability. This Electron Beam Lithography system presents a further evolutionary stage of the highly successful and field-proven EBPG series. It offers a wide range of leading edge solutions for both direct write nanolithography and R&D mask making in universities and commercial centers of excellence.
The electron beam lithography system for faster and better results
Accurate results, delivered at high speeds and reasonable costs
VOYAGER is recommended for all industrial and academic Electron Beam Lithography applications where the important objectives are high write throughput and maximum resolution.
As well as the newly developed, innovative eWRITE system architecture, Raith attaches great importance to an attractive price/performance ratio throughout the lifetime of the system.
FIB-SEM for FIB-centric nanofabrication
FIB centric lithography architcture and laser interferometer stage supported by a tailored SEM column
VELION is a novel FIB-SEM instrument in which FIB nanofabrication has matured into the standard technique for fabricating three dimensional and high resolution nanostructures, such as plasmonic devices, nano-fluidics, localized implantation and functionalization.
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