SONOSYS Ultraschallsysteme GmbH

Booth number 2577

www.sonosys.de

About us

SONOSYS® is specialized in the development, manufacturing and distribution of highly sophisticated Ultrasonic/Megasonic systems for single-wafer and batch processes, in the frequency range from 400 kHz to 5 MHz.

SONOSYS® Ultrasonic/Megasonic systems provide highly efficient removal of particles down to the nano range from substrates with fragile surfaces, such as Wafers, Flat Panel Displays, Masks, Micro Systems or special parts within the LIGA-Technique.

Our main markets:
• Semiconductor
• Micro/Nano Technology
• MEMS
• Hard Disc Drives
• Photovoltaics
• Optical Industry
• Food Industry
• Sonochemistry
• Research Institutes

Our main applications:
• Particle Removal
• SC1 Cleaning
• Resist Removal
• Wet Etching
• Post CMP Cleaning
• Acoustical Chemical Enhancement

Available SONOSYS® systems:
• Megasonic tanks
• Transducer plates
• Submersible transducers
• Face-to-face transducers
• Megasonic single/dual nozzle
• Shower nozzles
• Megasonic generators
• Atomizers

Products and services

SONOSYS® Megasonic systems provide highly efficient removal of nano sized particles from substrates, semiconductor wafers, masks, MEMS and LIGA.
Available products: Transducer plates, submersible transducer, Face-To-Face transducer, single and dual nozzles, atomizer and very compact, modular generators up to 2000 Watt.

Single and dual nozzles

The Megasonic single and dual nozzles (600kHz to 5 MHz) transmits the sonic wave into the flowing water and its surface. With up to 35 W concentrated on a small point of only 4 mm results in superb results in contactless cleaning. The dual nozzle works with two distinct frequencies and provides removal of a wider range of particles.

Submersible Transducers
400 kHz to 2 MHz

The SONOSYS® submersible transducers can be used with any vessel and medium and offer maximum flexibility. Made of stainless steel of PVDF in different sizes (4”, 6” or 8”) and with different frequencies (at power up to 2000 W) they fit many applications and set-ups.
Single and dual nozzles

The Megasonic single and dual nozzles (600kHz to 5 MHz) transmits the sonic wave into the flowing water and its surface. With up to 35 W concentrated on a small point of only 4 mm results in superb results in contactless cleaning. The dual nozzle works with two distinct frequencies and provides removal of a wider range of particles.

The single and dual nozzles are used in cleaning of single wafers, masks, LCD panels and substrates.

Further reading

Submersible Transducers

400 kHz / 600 kHz / 1 MHz / 2 MHz

The SONOSYS® submersible transducers can be used with any vessel and medium and offer maximum flexibility. Made of stainless steel of PVDF in different sizes (4”, 6” or 8”) and with different frequencies (at power up to 2000 W) they fit many applications and set-ups, particularly in experiments and in the lab.

Further reading

Address
SONOSYS Ultraschallsysteme GmbH
Daimlerstr. 6
75305 Neuenbuerg
Germany

Phone: +49 7082 79184-0
Fax: +49 7082 79184-99
Internet: www.sonosys.de
E-mail: Send message

Contact person

Ralf Emberger
Sales Director
Phone: +49 7082 7918418
E-mail: Send message

Representative
HOLD LEADING INTL CO, Ltd.
1F, No.221, Sec.2, Min Sheng Road
TW-220 New Taipei City
Taiwan R.O.C.

Phone: +886 2 8953 8388 Ext. 302
Internet: www.great-domain.com.tw/en/product_1016004.html
E-mail: Send message

News & Innovations

Megasonics nozzles up to 5 MHz

SONOSYS® proudly presents highly effiecent contact-less cleaning with Megasonic nozzle systems. In a wide range of frequencies ranging from 600 kHz up to 5 MHz, even smallest structures can be cleaned reliably from nano particles without damaging fragile structures.

The transducer in the Megasonic nozzle generates a Megasonic wave, which is transmitted through a flowing liquid (e.g.: DI-water) to the surface of the substrate. With up to 35 W concentrated on a small point of only 4 mm results in superb results in contactless cleaning. The dual nozzle works with two distinct frequencies and provides removal of a wider range of particles.

Applications:
Cleaning of single wafers, masks, LCDs, substrates and micro electro mechanical systems (MEMS). The 600 kHz system is used in the optics and medical industries to remove larger particles.


Further reading

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